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The thin film metrology systems industry is experiencing significant trends driven by advancements in technology and increasing application diversity. A notable trend is the integration of artificial intelligence (AI) and machine learning (ML) into metrology systems. These technologies enhance data analysis and predictive capabilities, leading to more accurate and efficient measurement processes. AI and ML technologies enable real-time monitoring, automated adjustments, and advanced error correction, which are critical for industries requiring high precision, such as semiconductors and photovoltaics. In 2023, Onto Innovation highlighted how AI and ML are being utilized to manage vast amounts of data in semiconductor fabrication, improving the performance of individual tools and optimizing the entire manufacturing process.
Another key trend is the growing focus on miniaturization and advanced materials. As devices and technologies continue to shrink, the demand for ultra-precise measurement systems increases. This trend is particularly evident in the semiconductor and electronics sectors, where advancements in thin film technologies are essential for enhancing performance and efficiency. For instance, In 2023, KLA's Aleris 8510 film metrology system was launched to meet the stringent requirements for measuring advanced high-k metal gate and ultra-thin decoupled plasma nitridation layers, reflecting the industry's shift towards miniaturization and the need for precise measurement capabilities.